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Analysis of institutional authors

Emilio RayónAuthor

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October 29, 2024
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Electrochemical oscillation of open circuit potential during immersion plating of copper on silicon

Publicated to: JOURNAL OF THE ELECTROCHEMICAL SOCIETY. 152 (8): 537-541 - 2005-01-01 152(8), DOI: 10.1149/1.1946369

Authors:

Emilio Rayón; Ester Pastor; Vitali Parkhutik
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Affiliations

- Author

Abstract

A new type of oscillation emerging during copper immersion plating on silicon in solutions containing HF was observed. It is the spontaneous oscillation of open-circuit potential rather than the oscillations which have been observed on silicon under high polarization. The oscillation appears at less-noble potential and in a limited HF concentration range, and the amplitude is small. The behavior is affected by the type of dopant and dopant concentration and by the surface condition. The phenomenon is likely to be explained based on reactions occurring during immersion plating in the presence of fluoride ions: the oxide formation-breakdown-repair model. However, some results cannot be simply explained by the model. (c) 2005 The Electrochemical Society. [DOI: 10.1149/1.1946369] All rights reserved.
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Keywords

Anodic-dissolutionCircuit oscillationsConcentration (process)Copper platingDopantsDoping (additives)Electrochemical oscillationsElectrodesElectrolytesFluorideImmersion platingInterfaceKineticsLayerMathematical modelsMechanismNetworks (circuits)Open circuitsP-siPolarizationPorous siliconSiliconSurface chemistry

Quality index

Bibliometric impact. Analysis of the contribution and dissemination channel

The work has been published in the journal JOURNAL OF THE ELECTROCHEMICAL SOCIETY due to its progression and the good impact it has achieved in recent years, according to the agency WoS (JCR), it has become a reference in its field. In the year of publication of the work, 2005, it was in position 8/21, thus managing to position itself as a Q1 (Primer Cuartil), in the category Electrochemistry.

Independientemente del impacto esperado determinado por el canal de difusión, es importante destacar el impacto real observado de la propia aportación.

Según las diferentes agencias de indexación, el número de citas acumuladas por esta publicación hasta la fecha 2026-04-02:

  • WoS: 8
  • Scopus: 12
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Impact and social visibility

From the perspective of influence or social adoption, and based on metrics associated with mentions and interactions provided by agencies specializing in calculating the so-called "Alternative or Social Metrics," we can highlight as of 2026-04-02:

  • The use of this contribution in bookmarks, code forks, additions to favorite lists for recurrent reading, as well as general views, indicates that someone is using the publication as a basis for their current work. This may be a notable indicator of future more formal and academic citations. This claim is supported by the result of the "Capture" indicator, which yields a total of: 10 (PlumX).
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Leadership analysis of institutional authors

This work has been carried out with international collaboration, specifically with researchers from: Japan.

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